The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 13, 2010

Filed:

May. 11, 2006
Applicant:

Jacek K. Tyminski, Mountain View, CA (US);

Inventor:

Jacek K. Tyminski, Mountain View, CA (US);

Assignee:

Nikon Precision Inc., Belmont, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2005.12); G03B 27/54 (2005.12); G03B 27/72 (2005.12); G03F 1/00 (2005.12);
U.S. Cl.
CPC ...
Abstract

Methods and apparatus for enabling both isolated and dense patterns to be accurately patterned onto a wafer are disclosed. According to one aspect of the present invention, an illumination system that is suitable for use as a part of a projection tool includes an illumination source and an illuminator aperture. The illuminator aperture has a center point and an outer edge, and also includes a first pole and a second pole. The first pole is defined substantially about the center point, and the second pole is defined substantially between the first pole and the outer edge of the first pole. The illumination source is arranged to provide a beam to the illuminator aperture.


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