The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2012
Filed:
Dec. 23, 2008
Stephen P. Renwick, San Bruno, CA (US);
Steven Douglas Slonaker, San Mateo, CA (US);
Stephen P. Renwick, San Bruno, CA (US);
Steven Douglas Slonaker, San Mateo, CA (US);
Nikon Precision Inc., Belmont, CA (US);
Abstract
A method for matching a first OPE curve () for a first exposure apparatus (A) used to transfer an image to a wafer () to a second OPE curve () of a second exposure apparatus (B). The method can include the step of adjusting a tilt of a wafer stage () that retains the wafer to adjust the first OPE curve. As provided herein, the first exposure apparatus (A) has the first OPE curve () because of the design of the components used in the first exposure apparatus (A), and the second exposure apparatus (B) has a second OPE curve () because of the design of the components used in the second exposure apparatus (B). Further, the tilt of the wafer stage () can be selectively adjusted until the first OPE curve () approximately matches the second OPE curve (). With this design, the two exposure apparatuses (A) (B) can be used for the same lithographic process. Stated in another fashion, exposure apparatuses (A) (B) from different manufacturers, when using the same reticle (), will transfer similar images to the wafer ().