The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 05, 2017

Filed:

Feb. 11, 2016
Applicants:

Nikon Corporation, Tokyo, JP;

Nikon Precision Inc., Belmont, CA (US);

Inventors:

Jacek Tyminski, Mountain View, CA (US);

Raluca Popescu, San Mateo, CA (US);

Tomoyuki Matsuyama, Saitama, JP;

Assignees:

NIKON CORPORATION, Tokyo, JP;

NIKON PRECISION INC, Belmont, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G03F 1/36 (2012.01); G03F 1/00 (2012.01); G03F 1/68 (2012.01);
U.S. Cl.
CPC ...
G03F 1/36 (2013.01); G03F 1/144 (2013.01); G03F 1/68 (2013.01); G06F 17/50 (2013.01); G06F 17/5081 (2013.01);
Abstract

A modeling technique is provided. The modeling technique includes inputting tool parameters into a model and inputting basic model parameters into the model. The technique further includes generating a simulated, corrected reticle design using the tool parameters and the basic model parameters. An image of test patterns is compared against the simulated, corrected reticle design. A determination is made as to whether δ<ε, wherein δrepresents model vs. exposure difference and εrepresents predetermined criteria. The technique further includes completing the model when δ<ε.


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