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Jiadong, Taiwan

Shang-Chih Chen

This inventor holds 15 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2006-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shang-Chih Chen. Retrieved from https://idiyas.com/inventor/shang-chih-chen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 15

% Patents Active = 80.0

Average Co-Inventor Count = 3.7

ph-index = 7

Forward Citations = 96(Granted Patents)


Location History:

  • Jiadong Township, Pingtung County, TW (2007)
  • Hsin-Chu, TW (2006 - 2012)
  • Jiadong Township, TW (2007 - 2017)

Company Filing History:

goldMedal15 out of 42,810 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2006-2017

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15 patents (USPTO):Explore Patents
1. 9711413 - High performance CMOS device design (2017-07-18),
2. 9159629 - High performance CMOS device design (2015-10-13),
3. 8759185 - Ultra-shallow junction MOSFET having a high-k gate dielectric and in-situ doped selective epitaxy source/drain extensions and a method of making same (2014-06-24),
4. 8507951 - High performance CMOS device design (2013-08-13),
5. 8097924 - Ultra-shallow junction MOSFET having a high-k gate dielectric and in-situ doped selective epitaxy source/drain extensions and a method of making same (2012-01-17),
6. 7829978 - Closed loop CESL high performance CMOS device (2010-11-09),
7. 7763945 - Strained spacer design for protecting high-K gate dielectric (2010-07-27),
8. 7564108 - Nitrogen treatment to improve high-k gate dielectrics (2009-07-21),
9. 7465972 - High performance CMOS device design (2008-12-16),
10. 7355235 - Semiconductor device and method for high-k gate dielectrics (2008-04-08),
11. 7354830 - Methods of forming semiconductor devices with high-k gate dielectric (2008-04-08),
12. 7332407 - Method and apparatus for a semiconductor device with a high-k gate dielectric (2008-02-19),
13. 7229893 - Method and apparatus for a semiconductor device with a high-k gate dielectric (2007-06-12),
14. 7205186 - System and method for suppressing oxide formation (2007-04-17),
15. 7045847 - Semiconductor device with high-k gate dielectric (2006-05-16),

Title: The Innovations of Shang-Chih Chen

Introduction

Shang-Chih Chen is a prominent inventor based in Jiadong, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 15 patents. His work focuses on high-performance CMOS device design, which is crucial for advancing modern electronics.

Latest Patents

One of Shang-Chih Chen's latest patents involves a sophisticated semiconductor device design. This device includes a gate that comprises a gate electrode and a gate dielectric underlying the gate electrode. A spacer is formed on the sidewall of the gate electrode and the gate dielectric. The design features a buffer layer with a first portion underlying the gate dielectric and the spacer, and a second portion adjacent to the spacer. Notably, the top surface of the second portion of the buffer layer is recessed below the top surface of the first portion. The source/drain region is substantially aligned with the spacer. The buffer layer is designed to have a greater lattice constant than the underlying semiconductor substrate. Additionally, the semiconductor device may include a semiconductor-capping layer between the buffer layer and the gate dielectric, which has a smaller lattice constant than the buffer layer.

Career Highlights

Shang-Chih Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His innovative designs and patents have contributed to the company's reputation for excellence in semiconductor manufacturing.

Collaborations

Shang-Chih Chen has collaborated with notable coworkers, including Chih-Hao Wang and Ching-Wei Tsai. Their combined expertise has further advanced the development of cutting-edge semiconductor technologies.

Conclusion

Shang-Chih Chen's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the future of electronics and semiconductor design.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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