Sanjeev Sapra

This inventor holds 31 USPTO granted patents and 8 published patent applications. Top assignees: Micron Technology Incorporated, Nan Ya Technology Corporation. Active years: 2012-2025.

USPTO Granted Patents = 31 (Patent Applications = 8)

% Patents Active = 100.0

Average Co-Inventor Count = 3.9

ph-index = 4

Forward Citations = 39(Granted Patents)

Company Filing History:

30 out of 39,102

Micron Technology Incorporated

patents

1 out of 2,540

Nan Ya Technology Corporation

patents

Years Active: 2012-2025

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Areas of Expertise:

Semiconductor Processing

Capacitor Formation

Sacrificial Polymer Materials

Vapor-Etch Cyclic Process

Surface Modification Compositions

Memory Array Structures

Storage Node Shaping

Silicon-Based Materials

High Aspect Ratio Structures

Column Formation

Semiconductor Device Structures

Etching Techniques

31 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12432943 - Over-sculpted storage node (2025-09-30),

2. 12193208 - Capacitors with electrodes having a portion of material removed, and related semiconductor devices, systems, and methods (2025-01-07),

3. 11651952 - Using sacrificial polymer materials in semiconductor processing (2023-05-16),

4. 11469103 - Semiconductor structure formation (2022-10-11),

5. 11361972 - Methods for selectively removing more-doped-silicon-dioxide relative to less-doped-silicon-dioxide (2022-06-14),

6. 11322388 - Semiconductor structure formation (2022-05-03),

7. 11127588 - Semiconductor processing applying supercritical drying (2021-09-21),

8. 11114443 - Semiconductor structure formation (2021-09-07),

9. 11011523 - Column formation using sacrificial material (2021-05-18),

10. 11011521 - Semiconductor structure patterning (2021-05-18),

11. 10978553 - Formation of a capacitor using a hard mask (2021-04-13),

12. 10978306 - Semiconductor recess formation (2021-04-13),

13. 10964475 - Formation of a capacitor using a sacrificial layer (2021-03-30),

14. 10930499 - Semiconductor structure formation (2021-02-23),

15. 10916418 - Using sacrificial polymer materials in semiconductor processing (2021-02-09),

Title: Sanjeev Sapra: Pioneering Inventor from Boise

Introduction: Sanjeev Sapra is a distinguished inventor based in Boise, ID, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Sanjeev Sapra holds several patents in the areas of artificial intelligence, renewable energy, and sustainable technologies, showcasing his commitment to creating a more efficient and eco-friendly future.

Career Highlights: With a career spanning over two decades, Sanjeev Sapra has worked with leading tech companies, research institutions, and universities to develop cutting-edge solutions that have revolutionized various industries.

Collaborations: Throughout his career, Sanjeev Sapra has collaborated with top scientists, engineers, and visionaries, pooling their expertise to push the boundaries of what is possible in the realm of innovation.

Conclusion: Sanjeev Sapra's passion for innovation, coupled with his relentless drive to make a positive impact on the world, solidifies his position as a trailblazing inventor shaping the future of technology.