The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2021
Filed:
Jan. 28, 2019
Micron Technology, Inc., Boise, ID (US);
Devesh Dadhich Shreeram, Boise, ID (US);
Diem Thy N. Tran, Garden City, ID (US);
Sanjeev Sapra, Boise, ID (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
Methods, apparatuses, and systems related to forming a capacitor column using a sacrificial material are described. An example method includes patterning a surface of a semiconductor substrate having: a first silicate material over the substrate, a first nitride material over the first silicate material, a sacrificial material over the first nitride material, a second silicate material over the sacrificial material, and a second nitride material over the second silicate material. The method further includes forming a column of capacitor material in an opening through the first silicate material, the first nitride material, the sacrificial material, the second silicate material, and the second nitride material. The method further includes removing the sacrificial material.