The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 09, 2021

Filed:

Nov. 07, 2019
Applicant:

Micron Technology, Inc., Boise, ID (US);

Inventors:

Michael T. Andreas, Boise, ID (US);

Jerome A. Imonigie, Boise, ID (US);

Prashant Raghu, Boise, ID (US);

Sanjeev Sapra, Boise, ID (US);

Ian K. McDaniel, Boise, ID (US);

Assignee:

Micron Technology, Inc., Boise, ID (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); B81C 1/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02057 (2013.01); B81C 1/00849 (2013.01); H01L 21/02118 (2013.01); H01L 21/02282 (2013.01); H01L 21/02334 (2013.01); B81C 2201/0108 (2013.01);
Abstract

In an example, a wet cleaning process is performed to clean a structure having features and openings between the features while preventing drying of the structure. After performing the wet cleaning process, a polymer solution is deposited in the openings while continuing to prevent any drying of the structure. A sacrificial polymer material is formed in the openings from the polymer solution. The structure may be used in semiconductor devices, such as integrated circuits, memory devices, MEMS, among others.


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