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For the Inventor, By the Inventor

Saratoga, CA, United States of America

S M Reza Sadjadi

This inventor holds 61 USPTO granted patents and 2 published patent applications, primarily in Semiconductor Processing (CPC class H01L). Top assignees: Lam Research Corporation, Applied Materials, Inc., Novellus Systems Incorporated. Active years: 2003-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: S M Reza Sadjadi. Retrieved from https://idiyas.com/inventor/s-m-reza-sadjadi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 61 

% Patents Active = 52.5

Average Co-Inventor Count = 3.1

ph-index = 12

Forward Citations = 1,254(Granted Patents)

Forward Citations (Not Self Cited) = 1,206(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Saratoga, CA (US) (2003 - 2016)
  • San Jose, CA (US) (2016 - 2019)

Company Filing History:

goldMedal58 out of 3,953 
 
Lam Research Corporation
 patents
silverMedal3 out of 14,482 
 
Applied Materials, Inc.
 patents
bronzeMedal1 out of 993 
 
Novellus Systems Incorporated
 patents
where one patent can have more than one assignee

Years Active: 2003-2019

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Areas of Expertise:
Plasma Processing
Substrate Uniformity
Photoresist
Pitch Reduction
Critical Dimension Reduction
Mask Trimming
Double Patterning
Capacitance Reduction
Etching Techniques
Self-Aligned Structures
Reticle Alignment
Gas Switching
61 patents (USPTO):Explore Patents
1. 10410889 - Systems and methods for electrical and magnetic uniformity and skew tuning in plasma processing reactors (2019-09-10),
2. 10177050 - Methods and apparatus for controlling substrate uniformity (2019-01-08),
3. 9412579 - Methods and apparatus for controlling substrate uniformity (2016-08-09),
4. 9384979 - Apparatus for the deposition of a conformal film on a substrate and methods therefor (2016-07-05),
5. 8986492 - Spacer formation for array double patterning (2015-03-24),
6. 8911587 - Photoresist double patterning apparatus (2014-12-16),
7. 8866202 - Device with gaps for capacitance reduction (2014-10-21),
8. 8864931 - Mask trimming (2014-10-21),
9. 8614149 - Critical dimension reduction and roughness control (2013-12-24),
10. 8592318 - Pitch reduction using oxide spacer (2013-11-26),
11. 8361564 - Protective layer for implant photoresist (2013-01-29),
12. 8357434 - Apparatus for the deposition of a conformal film on a substrate and methods therefor (2013-01-22),
13. 8343876 - Fast gas switching plasma processing apparatus (2013-01-01),
14. 8282847 - Photoresist double patterning (2012-10-09),
15. 8268118 - Critical dimension reduction and roughness control (2012-09-18),

Title: The Innovative Journey of S M Reza Sadjadi

Introduction: S M Reza Sadjadi is a visionary inventor based in Saratoga, CA (US) known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: S M Reza Sadjadi holds several patents in the areas of artificial intelligence, machine learning, and data analytics, showcasing his commitment to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, S M Reza Sadjadi has worked with leading tech companies, spearheading research and development projects that have led to significant technological breakthroughs.

Collaborations: Throughout his career, S M Reza Sadjadi has collaborated with top researchers, engineers, and scientists, fostering a culture of innovation and creativity that has resulted in transformative inventions.

Conclusion: S M Reza Sadjadi's relentless pursuit of innovation and his passion for creating cutting-edge technologies continue to inspire the next generation of inventors and innovators worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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