The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2013
Filed:
Jul. 22, 2011
S. M. Reza Sadjadi, Saratoga, CA (US);
Zhisong Huang, Fremont, CA (US);
Jose Tong Sam, Fremont, CA (US);
Eric H. Lenz, Pleasanton, CA (US);
Rajinder Dhindsa, San Jose, CA (US);
S. M. Reza Sadjadi, Saratoga, CA (US);
Zhisong Huang, Fremont, CA (US);
Jose Tong Sam, Fremont, CA (US);
Eric H. Lenz, Pleasanton, CA (US);
Rajinder Dhindsa, San Jose, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A plasma chamber with a plasma confinement zone with an electrode is provided. A gas distribution system for providing a first gas and a second gas is connected to the plasma chamber, wherein the gas distribution system can substantially replace one gas in the plasma zone with the other gas within a period of less than 1 s. A first frequency tuned RF power source for providing power to the electrode in a first frequency range is electrically connected to the at least one electrode wherein the first frequency tuned RF power source is able to minimize a reflected RF power. A second frequency tuned RF power source for providing power to the plasma chamber in a second frequency range outside of the first frequency range wherein the second frequency tuned RF power source is able to minimize a reflected RF power.