Location History:
- Ibaraki, JP (2015)
- Tsukuba, JP (2016 - 2024)
Company Filing History:
18 out of 370 
2 out of 1,710 
1 out of 5 Years Active: 2015-2024
Title: **Inventor Ryosuke Harada: Pioneering Advances in Chemical Vapor Deposition Technology**
Introduction
Ryosuke Harada is a notable inventor based in Tsukuba, Japan, who has made significant contributions to the fields of chemical vapor deposition and material science. With a remarkable portfolio of 19 patents to his name, Harada's innovations play a crucial role in advancing technology related to thin films and compounds.
Latest Patents
Harada's latest patents showcase his expertise in using organometallic compounds for chemical deposition methods. One of his recent innovations involves a chemical vapor deposition method using an organomanganese compound as a starting material. This invention focuses on producing manganese thin films or manganese compound thin films through chemical deposition, utilizing an organomanganese compound with specific ligands that enhance its potential for forming thin films effectively.
Another significant patent details a raw material for chemical deposition that contains an organoruthenium compound. This innovation aims to produce ruthenium thin films or ruthenium compound thin films, utilizing a unique organoruthenium compound with a trimethylenemethane-based ligand and carbonyl ligands, demonstrating Harada's continued commitment to advancing material science.
Career Highlights
Throughout his career, Ryosuke Harada has worked with prestigious organizations, most notably Tanaka Kikinzoku Kogyo Co., Ltd. and the National Institute of Advanced Industrial Science and Technology. His work in these institutions has yielded vital advancements in thin film technology, positioning him as a leader in the field.
Collaborations
Harada has collaborated with distinguished colleagues such as Toshiyuki Shigetomi and Kazuharu Suzuki. These collaborations have fostered an exchange of ideas and innovations that have led to pivotal developments in their shared areas of research.
Conclusion
Ryosuke Harada's contributions to innovation through his patents in chemical vapor deposition methods have positioned him as an important figure in the field of materials science. His dedication to research and collaboration continues to inspire advancements in thin film technology, making significant impacts in various industrial applications. The future holds great potential for Harada's ongoing work and new innovations in the realm of chemical deposition.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.