The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2024
Filed:
Jan. 28, 2021
Applicant:
Tanaka Kikinzoku Kogyo K.k., Tokyo, JP;
Inventors:
Ryosuke Harada, Tsukuba, JP;
Tomohiro Tsugawa, Tsukuba, JP;
Shigeyuki Ootake, Tsukuba, JP;
Teruhisa Iwai, Tsukuba, JP;
Seung-Joon Lee, Tsukuba, JP;
Assignee:
TANAKA KIKINZOKU KOGYO K.K., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/18 (2006.01); C07F 15/00 (2006.01);
U.S. Cl.
CPC ...
C23C 16/18 (2013.01); C07F 15/0046 (2013.01);
Abstract
The present invention relates to a raw material of an organoruthenium compound for producing a ruthenium thin film or a ruthenium compound thin film by a chemical deposition method. This organoruthenium compound is an organoruthenium compound represented by the following Formula 1 and including a trimethylenemethane-based ligand (L) and three carbonyl ligands coordinated to divalent ruthenium. In Formula 1, the trimethylenemethane-based ligand Lis represented by the following Formula 2: