The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 07, 2020

Filed:

Feb. 15, 2019
Applicant:

Tanaka Kikinzoku Kogyo K.k., Chiyoda-ku, Tokyo, JP;

Inventors:

Ryosuke Harada, Tsukuba, JP;

Toshiyuki Shigetomi, Tsukuba, JP;

Shunichi Nabeya, Tsukuba, JP;

Kazuharu Suzuki, Tsukuba, JP;

Akiko Kumakura, Tsukuba, JP;

Tatsutaka Aoyama, Tsukuba, JP;

Takayuki Sone, Tsukuba, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/18 (2006.01); C07F 13/00 (2006.01); C07F 15/00 (2006.01); C07F 15/02 (2006.01); C07F 15/06 (2006.01); C07F 17/00 (2006.01); C07F 19/00 (2006.01); C23C 16/06 (2006.01); C07F 15/04 (2006.01);
U.S. Cl.
CPC ...
C23C 16/18 (2013.01); C07F 13/00 (2013.01); C07F 15/00 (2013.01); C07F 15/0046 (2013.01); C07F 15/02 (2013.01); C07F 15/04 (2013.01); C07F 15/06 (2013.01); C07F 17/00 (2013.01); C07F 19/00 (2013.01); C23C 16/06 (2013.01);
Abstract

The present invention relates to a chemical deposition raw material including a heterogeneous polynuclear complex in which a cyclopentadienyl and a carbonyl are coordinated to a first transition metal and a second transition metal as central metals, the chemical deposition raw material being represented by the following formula. In the following formula, the first transition metal (M) and the second transition metal (M) are mutually different. The number of cyclopentadienyls (L) is 1 or more and 2 or less, and to the cyclopentadienyl is coordinated one of a hydrogen atom and an alkyl group with a carbon number of 1 or more and 5 or less as each of substituents Rto R. With the chemical deposition raw material of the present invention, a composite metal thin film or a composite metal compound thin film containing plural metals can be formed from a single raw material.


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