Akiko Kumakura

Title: Akiko Kumakura: Innovator in Chemical Deposition Technologies

Introduction

Akiko Kumakura is a prominent inventor based in Tsukuba, Japan. She has made significant contributions to the field of chemical deposition, holding a total of seven patents. Her work focuses on developing advanced materials and methods for creating thin films, which are essential in various technological applications.

Latest Patents

Among her latest patents is a chemical deposition raw material that includes a heterogeneous polynuclear complex. This invention relates to a chemical deposition raw material where a cyclopentadienyl and a carbonyl are coordinated to two different transition metals. The innovative aspect of this material is its ability to form composite metal thin films from a single raw material. Another notable patent involves an organoplatinum compound designed for the chemical deposition of platinum compound thin films. This compound is characterized by its high vapor pressure, allowing for the manufacturing of platinum thin films at low temperatures while maintaining moderate thermal stability.

Career Highlights

Akiko has worked with Tanaka Kikinzoku Kogyo Co., Ltd., where she has contributed to the advancement of chemical deposition technologies. Her expertise in this area has positioned her as a key figure in the development of innovative materials for thin film applications.

Collaborations

Throughout her career, Akiko has collaborated with notable colleagues such as Ryosuke Harada and Toshiyuki Shigetomi. These partnerships have further enhanced her research and development efforts in the field.

Conclusion

Akiko Kumakura's contributions to chemical deposition technologies exemplify her innovative spirit and dedication to advancing material science. Her patents reflect her commitment to creating efficient and effective solutions in the industry.