The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 18, 2018

Filed:

May. 09, 2016
Applicant:

Tanaka Kikinzoku Kogyo K.k., Chiyoda-ku, Tokyo, JP;

Inventors:

Ryosuke Harada, Tsukuba, JP;

Toshiyuki Shigetomi, Tsukuba, JP;

Kazuharu Suzuki, Tsukuba, JP;

Shunichi Nabeya, Tsukuba, JP;

Akiko Kumakura, Tsukuba, JP;

Tatsutaka Aoyama, Tsukuba, JP;

Takayuki Sone, Tsukuba, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/31 (2006.01); C07F 15/00 (2006.01); C23C 16/18 (2006.01); H01L 21/285 (2006.01); C09D 5/24 (2006.01);
U.S. Cl.
CPC ...
C07F 15/0086 (2013.01); C07F 15/00 (2013.01); C09D 5/24 (2013.01); C23C 16/18 (2013.01); H01L 21/285 (2013.01); H01L 21/28568 (2013.01); H01L 21/31 (2013.01);
Abstract

The present invention relates to a raw material for chemical deposition shown in a formulae below and including an organoplatinum compound in which diimine containing two imines and an alkyl anion are coordinated to divalent platinum. In the formulae, each of substituents Rto Ron the diimine represents a hydrogen atom, an alkyl group or the like and has a carbon number of 5 or less. Each of alkyl anions Rand Ris an alkyl group having a carbon number of 1 or more and 3 or less. The raw material has high vapor pressure and low decomposition temperature, and thus it is possible to manufacture a platinum thin film at low temperature.


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