Tsukuba, Japan

Toshiyuki Shigetomi



Average Co-Inventor Count = 4.7

ph-index = 1

Forward Citations = 7(Granted Patents)


Location History:

  • Ibaraki, JP (2015 - 2016)
  • Tsukuba, JP (2016 - 2022)

Company Filing History:


Years Active: 2015-2024

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17 patents (USPTO):Explore Patents

Title: Toshiyuki Shigetomi: Pioneering Innovations in Chemical Vapor Deposition

Introduction

Toshiyuki Shigetomi, based in Tsukuba, Japan, is a prominent inventor known for his significant contributions to the field of chemical deposition. With a remarkable portfolio of 17 patents, Shigetomi has established himself as a leader in developing innovative methods for producing thin films, particularly utilizing organomanganese and ruthenium compounds. His work has implications for various technological advancements in materials science.

Latest Patents

Shigetomi's recent patents showcase his innovative approach to chemical vapor deposition techniques. One of his latest inventions involves a chemical vapor deposition method using an organomanganese compound as a starting material. This method allows for the production of manganese thin films or manganese compound thin films. The raw material, represented by a specific chemical formula, includes a cyclopentadienyl ligand and an isocyanide ligand coordinated to manganese. This innovation enables the formation of high-quality manganese thin films using reducing gases such as hydrogen as reaction gases.

Additionally, he has developed a patented raw material for chemical deposition that contains a ruthenium complex. This invention relates to producing ruthenium thin films or ruthenium compound thin films. The raw material can produce high-quality thin films even without using a reaction gas that includes oxygen atoms. These patents highlight Shigetomi’s expertise in creating effective solutions for semiconductor and materials engineering.

Career Highlights

Throughout his career, Toshiyuki Shigetomi has worked with esteemed organizations, including Tanaka Kikinzoku Kogyo Co., Ltd. and the National Institute of Advanced Industrial Science and Technology. His affiliations with these leading companies reflect his commitment to advancing the field of chemical deposition and thin film technology. His work has not only contributed to academic research but has also had practical applications in various industries.

Collaborations

Shigetomi has collaborated with notable colleagues such as Ryosuke Harada and Kazuharu Suzuki. These partnerships have fostered an environment of innovation, allowing for the exchange of ideas and expertise that further enhance their projects. Working alongside other talented professionals has enabled him to push the boundaries of what is possible in chemical vapor deposition.

Conclusion

Toshiyuki Shigetomi stands out as a pioneering innovator in chemical vapor deposition. With an impressive track record of patents and collaborations, his contributions have significantly advanced the field. As the technology continues to evolve, Shigetomi's work sets the foundation for future innovations in thin film production and materials science, solidifying his role as a key figure in the industry.

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