The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2024
Filed:
Jun. 15, 2020
Applicant:
Tanaka Kikinzoku Kogyo K.k., Tokyo, JP;
Inventors:
Ryosuke Harada, Tsukuba, JP;
Tomohiro Tsugawa, Tsukuba, JP;
Toshiyuki Shigetomi, Tsukuba, JP;
Seung-Joon Lee, Tsukuba, JP;
Ketan Baban Katkar, Tsukuba, JP;
Assignee:
TANAKA KIKINZOKU KOGYO K.K., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/06 (2006.01); C07F 13/00 (2006.01); C23C 16/18 (2006.01);
U.S. Cl.
CPC ...
C23C 16/18 (2013.01); C07F 13/00 (2013.01);
Abstract
A raw material for chemical deposition for producing a manganese thin film or a manganese compound thin film by chemical deposition method, including an organomanganese compound represented Chemical Formula 1 in which a cyclopentadienyl ligand and an isocyanide ligand are coordinated to manganese, which has basic characteristics as a raw material for chemical deposition and enables formation of a manganese thin film with a reducing gas such as hydrogen used as a reaction gas.