The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 05, 2016

Filed:

Oct. 12, 2012
Applicant:

Tanaka Kikinzoku Kogyo K.k., Tokyo, JP;

Inventors:

Masayuki Saito, Ibaraki, JP;

Kazuharu Suzuki, Ibaraki, JP;

Toshiyuki Shigetomi, Ibaraki, JP;

Shunichi Nabeya, Ibaraki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 16/18 (2006.01); C07F 15/00 (2006.01); C23C 16/448 (2006.01); C23C 16/46 (2006.01);
U.S. Cl.
CPC ...
C23C 16/18 (2013.01); C07F 15/0086 (2013.01); C23C 16/4485 (2013.01); C23C 16/46 (2013.01);
Abstract

A chemical vapor deposition raw material for producing a platinum thin film or a platinum compound thin film by a chemical vapor deposition method, wherein the chemical vapor deposition raw material includes an organoplatinum compound having cyclooctadiene and alkyl anions coordinated to divalent platinum, and the organoplatinum compound is represented by the following formula. Here, one in which Rand Rare any combination of propyl and methyl, propyl and ethyl, or ethyl and methyl is particularly preferred. wherein Rand Rare alkyl groups, and Rand Rare different; and a number of carbon atoms of Rand Ris 3 to 5 in total.


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