The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 19, 2021

Filed:

Jul. 12, 2018
Applicant:

Tanaka Kikinzoku Kogyo K.k., Tokyo, JP;

Inventors:

Ryosuke Harada, Tsukuba, JP;

Shigeyuki Ootake, Tsukuba, JP;

Toshiyuki Shigetomi, Tsukuba, JP;

Kazuharu Suzuki, Tsukuba, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/285 (2006.01); C07F 15/00 (2006.01); C23C 16/18 (2006.01); H01L 29/45 (2006.01);
U.S. Cl.
CPC ...
C07F 15/0086 (2013.01); C23C 16/18 (2013.01); H01L 21/28518 (2013.01); H01L 29/45 (2013.01);
Abstract

A raw material for vapor deposition for producing a platinum thin film or a platinum compound thin film by a vapor deposition method. The raw material for vapor deposition includes an organoplatinum compound represented by the following formula, in which a cyclopentene-amine ligand and an alkyl ligand are coordinated to divalent platinum. The organoplatinum compound of the present invention has moderate thermal stability and can respond flexibly to severe film formation conditions, including a wider film formation area, higher throughput, and the like. (In the formula, R, R, and Rare each any one of a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an amino group, an imino group, a cyano group, and an isocyano group, each having 4 or less carbon atoms, and Rand Rare each an alkyl group having 1 or more and 3 or less carbon atoms.)


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