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For the Inventor, By the Inventor

Leuven, Belgium

Roel Gronheid

This inventor holds 23 USPTO granted patents and 6 published patent applications and 3 EPO patents, primarily in Lithography Technology. Top assignees: Imec Vzw, Kla Corporation, Asm IP Holding B.v.. Active years: 2010-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Roel Gronheid. Retrieved from https://idiyas.com/inventor/roel-gronheid

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 23 

% Patents Active = 82.6

 

Average Co-Inventor Count = 3.4

ph-index = 4

Forward Citations = 92(Granted Patents)


Location History:

  • Boutersem, BE (2010)
  • St. Agatha Rode, BE (2016 - 2019)
  • Huldenberg, BE (2012 - 2020)
  • Leuven, BE (2015 - 2024)

Company Filing History:

goldMedal11 out of 1,865 
 
Imec Vzw
 patents
silverMedal8 out of 619 
 
Kla Corporation
 patents
bronzeMedal3 out of 1,329 
 
Asm IP Holding B.v.
 patents
4. 3 out of 631 
 
Katholieke Universiteit Leuven
 patents
5. 3 out of 1,787 
 
Kla Tencor Corporation
 patents
6. 1 out of 10,918 
 
Tokyo Electron Limited
 patents
where one patent can have more than one assignee

Years Active: 2010-2026

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Areas of Expertise:
Particle Contamination
Through Silicon Via
3D Profilometry
Overlay Distortion
Extreme Ultraviolet Lithography
Metrology Measurements
Lithographic Mask
Directed Self-Assembly
Fin Structures
Conformal Coating
Dual Tone Development
Electromagnetic Radiation
23 patents (USPTO):Explore Patents
1. 12645152 - System and method for optimizing through silicon via overlay (2026-06-02),
2. 12644696 - System and method for detecting particle contamination on a bonding tool (2026-06-02),
3. 12372345 - 3D profilometry with a Linnik interferometer (2025-07-29),
4. 12164277 - System and method for mitigating overlay distortion patterns caused by a wafer bonding tool (2024-12-10),
5. 12153352 - System and method for focus control in extreme ultraviolet lithography systems using a focus-sensitive metrology target (2024-11-26),
6. 12013634 - Reduction or elimination of pattern placement error in metrology measurements (2024-06-18),
7. 11782411 - System and method for mitigating overlay distortion patterns caused by a wafer bonding tool (2023-10-10),
8. 11537043 - Reduction or elimination of pattern placement error in metrology measurements (2022-12-27),
9. 11460783 - System and method for focus control in extreme ultraviolet lithography systems using a focus-sensitive metrology target (2022-10-04),
10. 11092893 - Inspection sensitivity improvements for optical and electron beam inspection (2021-08-17),
11. 10901325 - Determining the impacts of stochastic behavior on overlay metrology data (2021-01-26),
12. 10824078 - Lithographic mask layer (2020-11-03),
13. 10741394 - Combined anneal and selective deposition process (2020-08-11),
14. 10720336 - Method for manufacturing a mask (2020-07-21),
15. 10551741 - Method of forming a directed self-assembled layer on a substrate (2020-02-04),

Title: Roel Gronheid - Innovator from Leuven, BE

Introduction: Roel Gronheid is a distinguished inventor hailing from the vibrant city of Leuven, Belgium. His contributions to the field of innovation have been significant and have left a lasting impact on various industries.

Latest Patents: Roel Gronheid holds several patents in the field of nanotechnology and semiconductor manufacturing processes. His innovative approaches have revolutionized the way these technologies are utilized in modern applications.

Career Highlights: With a background in materials science and engineering, Roel Gronheid has worked with leading research institutions and companies to develop cutting-edge technologies. His expertise in lithography and thin-film deposition has been instrumental in advancing the semiconductor industry.

Collaborations: Throughout his career, Roel Gronheid has collaborated with top universities and semiconductor companies to push the boundaries of technological innovation. His ability to bridge the gap between academia and industry has led to groundbreaking discoveries in the field.

Conclusion: In conclusion, Roel Gronheid stands as a visionary inventor whose work continues to shape the future of nanotechnology and semiconductor manufacturing. His dedication to innovation and collaboration sets him apart as a true pioneer in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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