The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2021
Filed:
Jul. 22, 2019
Applicant:
Kla Corporation, Milpitas, CA (US);
Inventors:
Andrew Cross, Hale, GB;
Roel Gronheid, Leuven, BE;
Assignee:
KLA Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/26 (2006.01); G01N 21/00 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/265 (2013.01); G01N 21/00 (2013.01); G03F 7/7065 (2013.01); G03F 7/70608 (2013.01);
Abstract
An inspection-sensitive additive can improve inspection of photoresist on semiconductor wafers. The inspection-sensitive additive can be used to stain the photoresist or can be deposited as a layer on the photoresist. The inspection-sensitive additive can have a k-value that is greater than 20% larger than a photoresist k-value of the photoresist layer for an inspection wavelength between 120 nm and 950 nm.