Newport, United Kingdom

Rhonda Hyndman

This inventor holds 13 USPTO granted patents and 1 published patent application and 8 EPO patents, primarily in Physical Vapor Deposition. Top assignees: Spts Technologies Limited, Other. Active years: 2017-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rhonda Hyndman. Retrieved from https://idiyas.com/inventor/rhonda-hyndman

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 13 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.9

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Maghera, GB (2017)
  • Newport, GB (2017 - 2024)

Company Filing History:

goldMedal10 out of 95 
 
Spts Technologies Limited
 patents
silverMedal2 out of 834,659 
Other
 patents
where one patent can have more than one assignee

Years Active: 2017-2025

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Areas of Expertise:
PVD Apparatus
Deposition Techniques
Stress Variation Control
Material Layer Thickness
Pulsed DC Deposition
DC Magnetron Sputtering
Silicon Dioxide Deposition
Aluminium Layer Deposition
SAW Device Manufacturing
13 patents (USPTO):Explore Patents

Title: Rhonda Hyndman: Pioneering Innovations in Material Layer Control

Introduction

Rhonda Hyndman, an accomplished inventor based in Newport, GB, has made significant contributions to the field of materials science with a remarkable portfolio of 11 patents. Her work mainly focuses on enhancing the technologies used in pulsed DC physical vapor deposition, a method critical for various applications in electronics and semiconductor manufacturing.

Latest Patents

One of Rhonda's latest inventions is a **method and apparatus for controlling stress variation in a material layer formed via pulsed DC physical vapor deposition**. This innovative method involves providing a chamber with a target for material layer formation and a substrate for deposition. The process includes generating a plasma within the chamber while applying a magnetic field to enhance the precision of the plasma localizations. Additionally, an RF bias attracts gas ions from the plasma towards specific regions on the substrate, effectively controlling stress variations in the material layer.

Another recent patent, **an apparatus and a method of controlling thickness variation in a material layer formed using physical vapor deposition**, introduces a novel magnet assembly designed for steering ions during the deposition process. This assembly incorporates a magnetic field generation arrangement that can rotate, allowing for dynamic adjustments in the magnetic field strength along the radius of the substrate, which contributes to uniform thickness across the material layer.

Career Highlights

Throughout her career, Rhonda Hyndman has demonstrated her exceptional skills and creativity while working with SPTS Technologies Limited among other companies. Her expertise in physical vapor deposition technologies has established her as a leading inventor in the industry, particularly in relation to stress and thickness control in material layers.

Collaborations

Rhonda has also collaborated with notable professionals in her field, including Scott Haymore and Steve Burgess. These collaborations have allowed for the exchange of ideas and innovations that have furthered advancements in material layer technology.

Conclusion

Rhonda Hyndman’s contributions to the field of materials science through her innovative patents underscore her role as a leading inventor. Her work not only enhances the manufacturing of semiconductor materials but also sets a high standard for future innovations in the industry. With 11 patents to her name and a continued commitment to research and development, Rhonda represents the spirit of innovation crucial for the advancement of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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