The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2021
Filed:
Apr. 04, 2017
Applicant:
Spts Technologies Limited, Newport, GB;
Inventors:
Scott Haymore, Newport, GB;
Amit Rastogi, Newport, GB;
Rhonda Hyndman, Newport, GB;
Steve Burgess, Newport, GB;
Ian Moncrieff, Wotton-under-Edge, GB;
Chris Kendal, Newport, GB;
Assignee:
SPTS TECHNOLOGIES LIMITED, Newport, GB;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/06 (2006.01); C23C 14/34 (2006.01); C23C 14/35 (2006.01); C23C 14/50 (2006.01); C23C 14/54 (2006.01); H01J 37/32 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/50 (2013.01); C23C 14/345 (2013.01); C23C 14/3407 (2013.01); C23C 14/3485 (2013.01); C23C 14/35 (2013.01); C23C 14/505 (2013.01); C23C 14/541 (2013.01); H01J 37/32715 (2013.01); H01J 37/3405 (2013.01); H01J 37/3411 (2013.01); H01J 37/3467 (2013.01); C23C 14/0617 (2013.01); C23C 14/0641 (2013.01); H01J 37/3426 (2013.01);
Abstract
A DC magnetron sputtering apparatus is for depositing a film on a substrate. The apparatus includes a chamber, a substrate support positioned within the chamber, a DC magnetron, and an electrical signal supply device for supplying an electrical bias signal that, in use, causes ions to bombard a substrate positioned on the substrate support. The substrate support includes a central region surrounded by an edge region, the central region being raised with respect to the edge region.