The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 09, 2025

Filed:

Jun. 24, 2024
Applicant:

Spts Technologies Limited, Newport, GB;

Inventors:

Kyle Hutchings, Newport, GB;

Tony Wilby, Newport, GB;

Ian Moncrieff, Newport, GB;

Rhonda Hyndman, Newport, GB;

Stephen Burgess, Newport, GB;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/50 (2006.01); C23C 14/34 (2006.01); C23C 14/35 (2006.01);
U.S. Cl.
CPC ...
C23C 14/505 (2013.01); C23C 14/345 (2013.01); C23C 14/35 (2013.01);
Abstract

A Physical Vapour Deposition (PVD) apparatus having a PVD chamber, a target, a substrate support in the PVD chamber comprising an upper rotatable portion having an upper surface on which a substrate can be supported and a lower stationary portion, an RF source configured to supply an RF signal having an RF power to the lower stationary portion, and an arrangement for rotating the upper rotatable portion during a PVD process performed in the PVD chamber. The upper rotatable portion and the lower stationary portion are spaced apart so that the RF power supplied to the lower stationary portion is capacitively coupled to the upper rotatable portion.


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