Edison, NJ, United States of America

Qing Min Wang

USPTO Granted Patents = 13 

 

Average Co-Inventor Count = 2.9

ph-index = 7

Forward Citations = 209(Granted Patents)


Location History:

  • North Plainfield, NJ (US) (2002)
  • Edison, NJ (US) (2002 - 2009)
  • North Andover, MA (US) (2009 - 2021)

Company Filing History:


Years Active: 2002-2021

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13 patents (USPTO):Explore Patents

Title: Qing Min Wang: Innovator in Polyarylene Resins and Organometallic Compounds

Introduction

Qing Min Wang is a prominent inventor based in Edison, NJ (US), known for his significant contributions to the field of materials science. With a total of 13 patents to his name, he has made remarkable advancements in the development of polyarylene resins and organometallic compounds.

Latest Patents

Among his latest patents, one focuses on polyarylene resins. This invention involves certain cyclopentadienone monomers that possess polar moieties, which enhance the solubility of polyarylene resins in specific organic solvents. These resins are particularly useful in forming layers for electronics applications. Another notable patent pertains to organometallic compounds, where he discloses methods for vapor depositing metal-containing films using certain organometallic compounds that include a carbonyl-containing ligand.

Career Highlights

Throughout his career, Qing Min Wang has worked with reputable companies such as The Boc Group, Inc. and Rohm & Haas Electronic Materials LLC. His work in these organizations has allowed him to develop innovative solutions that have had a lasting impact on the industry.

Collaborations

Qing Min Wang has collaborated with several talented individuals, including Ce Ma and Deodatta Vinayak Shenai-Khatkhate. These collaborations have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Qing Min Wang's contributions to the fields of polyarylene resins and organometallic compounds highlight his innovative spirit and dedication to advancing materials science. His work continues to influence various applications in electronics and beyond.

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