The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7514119 B1

PDF
Full Text
Expired
Date of Patent:
Apr. 07, 2009

Filed:

Apr. 10, 2006
Applicants:

Ce MA, Cary, NC (US);

Qing Min Wang, Edison, NJ (US);

Patrick J. Helly, Valley Center, CA (US);

Richard Hogle, Oceanside, CA (US);

Inventors:

Ce Ma, Cary, NC (US);

Qing Min Wang, Edison, NJ (US);

Patrick J. Helly, Valley Center, CA (US);

Richard Hogle, Oceanside, CA (US);

Assignee:

Linde, Inc., Murray Hill, NJ (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A unique combination of solution stabilization and delivery technologies with special ALD operation is provided. A wide range of low volatility solid ALD precursors dissolved in solvents are used. Unstable solutes may be stabilized in solution and all of the solutions may be delivered at room temperature. After the solutions are vaporized, the vapor phase precursors and solvents are pulsed into a deposition chamber to assure true ALD film growth.


Find Patent Forward Citations

Ma, Ce. (2009). Method and apparatus for using solution based precursors for atomic layer deposition (U.S. Patent No. 7514119). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7514119

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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