This inventor holds 3 USPTO granted patents and 4 published patent applications. Top assignees: The Boc Group, Inc., Linde Gmbh. Active years: 2002-2009.
Company Filing History:
Years Active: 2002-2009
Title: The Innovative Contributions of Patrick Joseph Helly
Introduction
Patrick Joseph Helly is a notable inventor based in Valley Center, CA (US). He has made significant contributions to the field of semiconductor technology, particularly in atomic layer deposition and dielectric films. With a total of 3 patents, Helly's work showcases his expertise and innovative spirit.
Latest Patents
One of Helly's latest patents is titled "Method and apparatus for using solution based precursors for atomic layer deposition." This invention presents a unique combination of solution stabilization and delivery technologies, enabling the use of low volatility solid ALD precursors dissolved in solvents. The method allows unstable solutes to be stabilized in solution, which can then be delivered at room temperature. After vaporization, the vapor phase precursors and solvents are pulsed into a deposition chamber to ensure true ALD film growth. Another significant patent is "Methods for forming low-k dielectric films," which discloses the use of a polyhedral oligomeric silsesquioxane compound and linking agent to create an ultra low-k dielectric film on semiconductor surfaces. This reaction occurs within a chemical vapor deposition chamber, highlighting Helly's innovative approach to material science.
Career Highlights
Throughout his career, Patrick Joseph Helly has worked with prominent companies such as The Boc Group, Inc. and Linde GmbH. His experience in these organizations has contributed to his development as a leading inventor in his field.
Collaborations
Helly has collaborated with notable colleagues, including Richard A. Hogle and Ce Ma. These partnerships have likely enriched his work and expanded the impact of his inventions.
Conclusion
Patrick Joseph Helly's contributions to the field of semiconductor technology through his innovative patents demonstrate his expertise and commitment to advancing the industry. His work continues to influence the development of new materials and processes in the realm of atomic layer deposition and dielectric films.