The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2005
Filed:
Apr. 12, 2002
Applicants:
Richard A. Hogle, Oceanside, CA (US);
Patrick Joseph Helly, Valley Center, CA (US);
Ce MA, Apex, NC (US);
Laura Joy Miller, San Diego, CA (US);
Inventors:
Richard A. Hogle, Oceanside, CA (US);
Patrick Joseph Helly, Valley Center, CA (US);
Ce Ma, Apex, NC (US);
Laura Joy Miller, San Diego, CA (US);
Assignee:
The BOC Group, Inc., Murray Hill, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L021/44 ;
U.S. Cl.
CPC ...
Abstract
The use of a polyhedral oligomeric silsesquioxane compound and linking agent to form an ultra low-k dielectric film on semiconductor or integrated circuit surfaces is disclosed. The reaction between the polyhedral oligomeric silsesquioxane compound and linking agent is done in a chemical vapor deposition chamber.