Richard A Hogle

This inventor holds 7 USPTO granted patents and 6 published patent applications. Top assignees: The Boc Group, Inc., Edwards Limited, Linde Gmbh. Active years: 1996-2009.

USPTO Granted Patents = 7 (Patent Applications = 6)

% Patents Active = 57.1

Average Co-Inventor Count = 4.5

ph-index = 5

Forward Citations = 320(Granted Patents)

Company Filing History:

Years Active: 1996-2009

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7 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7638106 - Method of treating a gas stream (2009-12-29),

2. 7514119 - Method and apparatus for using solution based precursors for atomic layer deposition (2009-04-07),

3. 6955707 - Method of recycling fluorine using an adsorption purification process (2005-10-18),

4. 6936537 - Methods for forming low-k dielectric films (2005-08-30),

5. 6818566 - Thermal activation of fluorine for use in a semiconductor chamber (2004-11-16),

6. 6361020 - Valve for use with high purity gas (2002-03-26),

7. 5485736 - Seamless cylinder shell construction (1996-01-23),

Title: Richard A. Hogle: Innovator in Atomic Layer Deposition Technologies

Introduction

Richard A. Hogle is a notable inventor based in Oceanside, CA (US), recognized for his contributions to the field of atomic layer deposition (ALD). With a total of 7 patents, Hogle has developed innovative methods that enhance the efficiency and effectiveness of gas stream treatment in ALD processes.

Latest Patents

Hogle's latest patents include a method of treating a gas stream exhausted from an ALD process chamber. This method involves conveying the gas stream to a mixing chamber where a reactant is supplied to react with one of the gaseous precursors, forming solid material. The gas stream is then directed to a cyclone separator to separate the solid material from the gas stream. This innovative approach helps inhibit unwanted reactions within the pump, improving the overall process efficiency. Another significant patent is the method and apparatus for using solution-based precursors for ALD. This invention combines solution stabilization and delivery technologies, allowing for the use of low volatility solid ALD precursors dissolved in solvents, which can be delivered at room temperature for optimal film growth.

Career Highlights

Throughout his career, Richard Hogle has worked with prominent companies such as The BOC Group, Inc. and Linde GmbH. His experience in these organizations has contributed to his expertise in the field of ALD and gas treatment technologies.

Collaborations

Hogle has collaborated with notable professionals in his field, including Peter Harold Buckley and Patrick Joseph Helly. These collaborations have further enriched his work and innovations in atomic layer deposition.

Conclusion

Richard A. Hogle's contributions to atomic layer deposition technologies demonstrate his commitment to innovation and excellence in the field. His patents reflect a deep understanding of gas treatment processes, making significant advancements in the industry.