The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 2009
Filed:
Apr. 21, 2006
Christopher Mark Bailey, Horsham, GB;
Michael Andrew Galtry, Worthing, GB;
David Engerran, Arundel, GB;
Andrew James Seeley, Bristol, GB;
Geoffrey Young, Weston-super-Mare, GB;
Michael Alan Eric Wilders, Horsham, GB;
Kenneth Allen Aitchison, Los Gatos, CA (US);
Richard A. Hogle, Oceanside, CA (US);
Christopher Mark Bailey, Horsham, GB;
Michael Andrew Galtry, Worthing, GB;
David Engerran, Arundel, GB;
Andrew James Seeley, Bristol, GB;
Geoffrey Young, Weston-super-Mare, GB;
Michael Alan Eric Wilders, Horsham, GB;
Kenneth Allen Aitchison, Los Gatos, CA (US);
Richard A. Hogle, Oceanside, CA (US);
Edwards Limited, Crawley, West Sussex, GB;
Abstract
A method is described of treating a gas stream exhausted from an atomic layer deposition (ALD) process chamber to which two or more gaseous precursors are alternately supplied. Between the process chamber and a vacuum pump used to draw the gas stream from the chamber, the gas stream is conveyed to a gas mixing chamber, to which a reactant is supplied for reacting with one of the gaseous precursors to form solid material. The gas stream is then conveyed to a cyclone separator to separate solid material from the gas stream. By deliberately reacting a non-reacted precursor to form solid material upstream from the pump, reaction within the pump of the non-reacted precursor and a second non-reacted precursor subsequently drawn from the chamber by the pump can be inhibited.