Company Filing History:
Years Active: 2009-2011
Title: Innovations of David Engerran
Introduction
David Engerran is an accomplished inventor based in Arundel, Great Britain. He has made significant contributions to the field of gas treatment technologies, holding two patents that showcase his innovative approach to solving complex engineering challenges.
Latest Patents
Engerran's latest patents include a trap device designed for removing species from a gas stream drawn from an enclosure by a vacuum pump. This device features a casing with an inlet for receiving the gas stream, an outlet for exhausting the gas stream, and two chambers for conveying the gas stream. It also includes means for selectively diverting the gas stream and a plurality of cartridges that provide flow passages for gas, each housing means for removing species as solid material. Another notable patent is a method of treating a gas stream exhausted from an atomic layer deposition (ALD) process chamber. This method involves conveying the gas stream to a mixing chamber where a reactant is supplied to react with gaseous precursors, forming solid material that is then separated from the gas stream.
Career Highlights
Engerran works at Edwards Limited, a company known for its advanced vacuum and abatement solutions. His work has significantly impacted the efficiency and effectiveness of gas treatment processes in various industrial applications.
Collaborations
Engerran collaborates with talented individuals such as Christopher Mark Bailey and Michael Andrew Galtry, contributing to a dynamic team focused on innovation and excellence in their field.
Conclusion
David Engerran's contributions to gas treatment technologies through his patents reflect his dedication to innovation and engineering excellence. His work continues to influence the industry and pave the way for future advancements.