Horsham, United Kingdom

Michael Alan Eric Wilders

USPTO Granted Patents = 1 

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Michael Alan Eric Wilders: Innovator in Gas Stream Treatment

Introduction

Michael Alan Eric Wilders is a notable inventor based in Horsham, GB. He has made significant contributions to the field of gas treatment, particularly in processes related to atomic layer deposition (ALD). His innovative approach has led to the development of a unique method that enhances the efficiency of gas stream management.

Latest Patents

Wilders holds a patent for a "Method of treating a gas stream." This patent describes a process for treating gas streams exhausted from an ALD process chamber, where two or more gaseous precursors are alternately supplied. The method involves conveying the gas stream to a gas mixing chamber, where a reactant is introduced to react with one of the gaseous precursors, forming solid material. The gas stream is then directed to a cyclone separator to separate the solid material from the gas stream. This innovative approach helps inhibit unwanted reactions within the vacuum pump, enhancing the overall efficiency of the process.

Career Highlights

Wilders is currently employed at Edwards Limited, a company known for its advanced technology in vacuum and abatement solutions. His work at Edwards Limited has allowed him to apply his inventive skills in a practical setting, contributing to the company's reputation for innovation in the industry.

Collaborations

Some of his notable coworkers include Christopher Mark Bailey and Michael Andrew Galtry. Their collaboration has likely fostered an environment of creativity and innovation, further enhancing the development of new technologies in their field.

Conclusion

Michael Alan Eric Wilders is a distinguished inventor whose work in gas stream treatment has made a significant impact in the field of atomic layer deposition. His innovative methods and contributions continue to influence advancements in technology.

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