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For the Inventor, By the Inventor

Portland, OR, United States of America

Qiliang Yan

USPTO Granted Patents = 20

Average Co-Inventor Count = 2.9

ph-index = 5

Forward Citations = 71(Granted Patents)


Location History:

  • Hillsboro, OR (US) (2007 - 2010)
  • Sunnyvale, CA (US) (2011)
  • Portland, OR (US) (2009 - 2022)

Company Filing History:

goldMedal19 out of 2,485 
 
Synopsys, Inc.
 patents
silverMedal1 out of 832,680 
Other
 patents

Years Active: 2007-2022

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20 patents (USPTO):
1. 11314171 - Lithography improvement based on defect probability distributions and critical dimension variations (2022-04-26),
2. 10691015 - Integrated mask-aware lithography modeling to support off-axis illumination and multi-tone masks (2020-06-23),
3. 10635776 - Producing mask layouts with rounded corners (2020-04-28),
4. 9354511 - Integrated mask-aware lithography modeling to support off-axis illumination and multi-tone masks (2016-05-31),
5. 9348964 - MASK3D model accuracy enhancement for small feature coupling effect (2016-05-24),
6. 8972229 - Fast 3D mask model based on implicit countors (2015-03-03),
7. 8918743 - Edge-based full chip mask topography modeling (2014-12-23),
8. 8719736 - Compact and accurate wafer topography proximity effect modeling for full chip simulation (2014-05-06),
9. 8296688 - Evaluating the quality of an assist feature placement based on a focus-sensitive cost-covariance field (2012-10-23),
10. 8184897 - Method and apparatus for determining an optical threshold and a resist bias (2012-05-22),
11. 7954071 - Assist feature placement based on a focus-sensitive cost-covariance field (2011-05-31),
12. 7933471 - Method and system for correlating physical model representation to pattern layout (2011-04-26),
13. 7784018 - Method and apparatus for identifying a manufacturing problem area in a layout using a gradient-magnitude of a process-sensitivity model (2010-08-24),
14. 7739645 - Method and apparatus for determining a process model using a 2-D-pattern detecting kernel (2010-06-15),
15. 7721246 - Method and apparatus for quickly determining the effect of placing an assist feature at a location in a layout (2010-05-18),

Title: Innovations in Lithography: The Patents of Qiliang Yan

Introduction: Qiliang Yan, based in Portland, OR, has made significant contributions to the field of lithography through his impressive portfolio of 20 patents. His work primarily focuses on enhancing lithography configurations to improve operational efficiency and outcome accuracy in semiconductor manufacturing.

Latest Patents: Among his latest innovations are two noteworthy patents. The first patent addresses lithography improvement based on defect probability distributions and critical dimension variations. This invention involves a method to enhance lithography configurations by utilizing a processor to determine a defect-based focus exposure window (FEW). It takes into account the acceptable level of defects and variations by analyzing the predicted probability of defects on the wafer. The processor also assesses a critical dimension (CD)-based FEW, aiming to optimize the overlap between both FEWs to ensure better accuracy in the lithography process.

The second patent, titled "Integrated Mask-Aware Lithography Modeling to Support Off-Axis Illumination and Multi-Tone Masks," presents a novel modeling method for optical lithography simulation using multi-tone masks. This includes generating a transmission function matrix based on the mask settings, transforming light intensity calculations, and maintaining accuracy while computing light intensity.

Career Highlights: Qiliang Yan's career has seen him contribute to esteemed companies in the semiconductor industry, including Synopsys, Inc. His technical expertise has been pivotal in developing advanced methodologies that propel the field of lithography forward.

Collaborations: Throughout his career, Qiliang Yan has collaborated with notable professionals, including Lawrence S. Melvin, III, and James Patrick Shiely. These partnerships have undoubtedly enriched his research and innovation output, leading to significant advancements in lithography technologies.

Conclusion: Qiliang Yan's contributions to lithography, evidenced by his patents and collaborations, highlight his status as an influential innovator in the field. His work continues to pave the way for more refined and effective lithography techniques, showcasing the importance of innovation in the realm of semiconductor manufacturing.

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