The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2020
Filed:
May. 31, 2016
Applicant:
Synopsys, Inc., Mountain View, CA (US);
Inventors:
Hongbo Zhang, Beaverton, OR (US);
Qiliang Yan, Portland, OR (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 7/60 (2006.01); G03F 1/36 (2012.01); G03F 7/20 (2006.01); G06F 30/20 (2020.01); G03F 7/00 (2006.01); G06F 17/11 (2006.01);
U.S. Cl.
CPC ...
G03F 1/36 (2013.01); G03F 7/00 (2013.01); G03F 7/705 (2013.01); G03F 7/70125 (2013.01); G03F 7/70283 (2013.01); G06F 17/11 (2013.01); G06F 30/20 (2020.01);
Abstract
A method and apparatus of a novel modeling scheme for performing optical lithography simulation for a multi-tone mask with a plurality of mask tones is described. The method generates a transmission function matrix based on a setting of the multi-tone mask. The method applies the transmission function matrix to transform a formula for calculating light intensity from Abbe's form to Hopkins' form while maintaining the accuracy of Abbe's form. The method then computes the light intensity using the transformed formula.