The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2010
Filed:
Oct. 19, 2006
Jianliang LI, Hillsboro, OR (US);
Qiliang Yan, Portland, OR (US);
Lawrence S. Melvin, Iii, Hillsboro, OR (US);
Levi D. Barnes, Hillsboro, OR (US);
Abani M. Biswas, Beaverton, OR (US);
Alakananda A. Biswas, Legal Representative, Beaverton, OR (US);
Jianliang Li, Hillsboro, OR (US);
Qiliang Yan, Portland, OR (US);
Lawrence S. Melvin, III, Hillsboro, OR (US);
Levi D. Barnes, Hillsboro, OR (US);
Abani M. Biswas, Beaverton, OR (US);
Alakananda A. Biswas, legal representative, Beaverton, OR (US);
Synopsys, Inc., Mountain View, CA (US);
Abstract
One embodiment of the present invention determines the effect of placing an assist feature at a location in a layout. During operation, the system receives a first value which was pre-computed by convolving a model with a layout at an evaluation point, wherein the model models semiconductor manufacturing processes. Next, the system determines a second value by convolving the model with an assist feature, which is assumed to be located at a first location which is in proximity to the evaluation point. The system then determines the effect of placing an assist feature using the first value and the second value. An embodiment of the present invention can be used to determine a substantially optimal location for placing an assist feature in a layout.