Hillsboro, OR, United States of America

Jianliang Li


Average Co-Inventor Count = 4.0

ph-index = 3

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 2010-2012

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7 patents (USPTO):Explore Patents

Title: Innovations of Jianliang Li

Introduction

Jianliang Li is a prominent inventor based in Hillsboro, Oregon, known for his significant contributions to the field of photolithography. With a total of seven patents to his name, he has developed innovative solutions that enhance the efficiency and effectiveness of lithography processes.

Latest Patents

One of Jianliang Li's latest patents is titled "Evaluating the quality of an assist feature placement based on a focus-sensitive cost-covariance field." This invention provides a system that determines the optimal placement of assist features within a post-optical proximity correction (post-OPC) mask layout. The system constructs a focus-sensitive cost function based on target patterns and computes a cost-covariance field to generate assist features for the mask layout.

Another notable patent is "Method and apparatus for determining an optical threshold and a resist bias." This invention outlines techniques for determining modeling parameters for a photolithography process. The system identifies an iso-focal pattern in a layout and determines aerial-image-intensity values to establish an optical threshold and resist bias, which are crucial for modeling the photolithography process.

Career Highlights

Jianliang Li is currently employed at Synopsys, Inc., where he continues to innovate and contribute to advancements in photolithography technology. His work has had a significant impact on the industry, enhancing the capabilities of lithography systems.

Collaborations

Jianliang Li has collaborated with notable colleagues, including Qiliang Yan and Lawrence S. Melvin III, further enriching his work and contributions to the field.

Conclusion

Jianliang Li's innovative patents and contributions to photolithography demonstrate his expertise and commitment to advancing technology in this critical area. His work continues to influence the industry and pave the way for future innovations.

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