Company Filing History:
Years Active: 2008-2012
Title: Innovations of Levi D Barnes
Introduction
Levi D Barnes is an accomplished inventor based in Hillsboro, OR (US). He has made significant contributions to the field of technology, particularly in the area of assist feature placement in lithography systems. With a total of 6 patents to his name, Barnes continues to push the boundaries of innovation.
Latest Patents
Barnes's latest patents include groundbreaking inventions that enhance the quality of assist feature placement. One notable patent is titled "Evaluating the quality of an assist feature placement based on a focus-sensitive cost-covariance field." This invention provides a system that determines the optimal placement of assist features within a post-optical proximity correction (post-OPC) mask layout. The system constructs a focus-sensitive cost function based on target patterns and computes a cost-covariance field to generate assist features effectively.
Another significant patent is "Model-based assist feature placement using inverse imaging approach." This invention outlines techniques to identify locations for placing assist features in a target mask layout. By determining a spatial sampling frequency and generating a grayscale image, the system can compute an inverse mask field and filter it to identify optimal assist feature locations.
Career Highlights
Levi D Barnes is currently employed at Synopsys, Inc., where he applies his expertise in developing innovative solutions for the semiconductor industry. His work focuses on improving lithography processes, which are crucial for the manufacturing of integrated circuits.
Collaborations
Barnes collaborates with talented individuals in his field, including Benjamin David Painter and Qiliang Yan. Their combined efforts contribute to advancing technology and enhancing the efficiency of lithography systems.
Conclusion
Levi D Barnes is a notable inventor whose work in assist feature placement has led to significant advancements in lithography technology. His contributions continue to shape the future of the semiconductor industry.
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