The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2014
Filed:
Aug. 12, 2013
Synopsys, Inc., Mountain View, CA (US);
Qiliang Yan, Portland, OR (US);
Hongbo Zhang, Beaverton, OR (US);
Ebo Croffie, Portland, OR (US);
Lin Zhang, Fremont, CA (US);
Yongfa Fan, Sunnyvale, CA (US);
Peter Brooker, Georgetown, TX (US);
Qian Ren, Portland, OR (US);
Synopsys, Inc., Mountain View, CA (US);
Abstract
A method and apparatus of a novel full chip edge-based mask three-dimensional (3D) model for performing photolithography simulation is described. The method applies a thin mask model to a mask design layout to create a thin mask transmission. The method generates a thick mask model that has a plurality of edge-based kernels. The method applies the thick mask model to the mask design layout to create a mask 3D residual. The method combines the thin mask transmission and the mask 3D residual to create a mask 3D transmission.