Ebo H Croffie

Title: Ebo H Croffie: Innovator in Optical Lithography

Introduction

Ebo H Croffie is a prominent inventor based in Portland, OR (US), known for her significant contributions to the field of optical lithography. With a total of 15 patents to her name, she has made remarkable advancements in the technology that underpins modern semiconductor manufacturing.

Latest Patents

Croffie's latest patents include innovative methods and apparatus for optical direct write phase shift lithography. One of her notable inventions, "Maskless vortex phase shift optical direct write lithography," provides a lithography system and method that utilizes a mirror array to generate vortex phase shift optical patterns directed onto a photosensitive layer of a substrate. This technology facilitates efficient pattern transfer using vortex phase shift exposure patterns. Another significant patent is the "Edge-based full chip mask topography modeling," which describes a novel method for performing photolithography simulation. This method applies a thin mask model to a mask design layout, generating a thick mask model with edge-based kernels, ultimately creating a mask 3D transmission.

Career Highlights

Throughout her career, Ebo H Croffie has worked with leading companies in the industry, including LSI Corporation and LSI Logic Corporation. Her work has been instrumental in advancing the capabilities of photolithography, which is crucial for the production of integrated circuits.

Collaborations

Croffie has collaborated with notable professionals in her field, including Nicholas K Eib and Neal Patrick Callan. These collaborations have further enriched her work and contributed to her innovative projects.

Conclusion

Ebo H Croffie's contributions to optical lithography demonstrate her expertise and commitment to innovation in the field. Her patents and career achievements reflect her significant impact on technology and the semiconductor industry.