The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2006
Filed:
May. 18, 2004
Applicant:
Ebo Croffie, Portland, OR (US);
Inventor:
Ebo Croffie, Portland, OR (US);
Assignee:
LSI Logic Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method and system for performing optical proximity correction (OPC) on an integrated circuit (IC) mask design is disclosed. The system and method of the present invention includes identifying a feature in the IC mask design, generating an isofocal contour for the identified feature, wherein the isofocal contour is a continuum of isofocal points corresponding to points on an edge of the identified feature, and utilizing the isofocal contour to estimate an amount of correction needed to produce a resist image significantly identical to the identified feature.