Peter Brooker

Title: The Innovative Contributions of Peter Brooker

Introduction

Peter Brooker is a notable inventor based in Georgetown, TX (US). He has made significant contributions to the field of photolithography through his innovative patent. His work is recognized for its impact on the semiconductor industry, particularly in the area of mask design.

Latest Patents

Peter Brooker holds a patent for an "Edge-based full chip mask topography modeling." This patent describes a method and apparatus for creating a novel full chip edge-based mask three-dimensional (3D) model for performing photolithography simulation. The method applies a thin mask model to a mask design layout to create a thin mask transmission. It generates a thick mask model that has a plurality of edge-based kernels. Furthermore, the method applies the thick mask model to the mask design layout to create a mask 3D residual. Finally, it combines the thin mask transmission and the mask 3D residual to create a mask 3D transmission. This innovative approach enhances the accuracy and efficiency of photolithography processes.

Career Highlights

Peter Brooker is currently employed at Synopsys, Inc., a leading company in electronic design automation. His work at Synopsys has allowed him to further develop his expertise in semiconductor technologies and contribute to cutting-edge innovations in the field.

Collaborations

Peter has collaborated with esteemed colleagues such as Qiliang Yan and Hongbo Zhang. These collaborations have fostered a productive environment for innovation and have led to advancements in their respective areas of expertise.

Conclusion

Peter Brooker's contributions to the field of photolithography through his patent and work at Synopsys, Inc. highlight his role as an influential inventor. His innovative methods continue to shape the future of semiconductor technology.