The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2015
Filed:
Mar. 14, 2013
Synopsys, Inc., Mountain View, CA (US);
Zhijie Deng, San Diego, CA (US);
Qiliang Yan, Portland, OR (US);
James P. Shiely, Portland, OR (US);
Synopsys, Inc., Mountain View, CA (US);
Abstract
Computer-readable medium and methods for photolithographic simulation of scattering. A design layout comprising a layout polygon is received. A skeleton representation of a mask shape that is created responsive to e-beam writing of the layout polygon is generated. The skeleton representation is defined by a plurality of skeleton points. Individual scattering patterns for the skeleton points are selected from a lookup table of pre-determined scattering patterns. Each of the individual scattering patterns representing an amount of optical scattering for a corresponding one of the skeleton points. A simulated wafer image is produced responsive to the individual scattering patterns.