Zhijie Deng

Title: Zhijie Deng: Innovator in Photolithographic Simulation and Image Conversion

Introduction

Zhijie Deng is a prominent inventor based in San Diego, CA, known for his contributions to the fields of photolithographic simulation and image processing. With a total of 2 patents, he has made significant advancements that enhance the efficiency and accuracy of integrated circuit design.

Latest Patents

Zhijie Deng's latest patents include "Fast 3D mask model based on implicit contours" and "Non-linear rasterized contour filters." The first patent focuses on a computer-readable medium and methods for photolithographic simulation of scattering. This innovation involves generating a skeleton representation of a mask shape in response to e-beam writing, which is defined by multiple skeleton points. Individual scattering patterns for these points are selected from a lookup table, ultimately producing a simulated wafer image. The second patent describes a system that preserves the shape of a contour when converting an image to a different resolution. This system divides the first image into regions of pixel values and determines the contribution of each region to the pixel values in the second image, using a nonlinear function based on the values in the region.

Career Highlights

Zhijie Deng is currently employed at Synopsys, Inc., where he applies his expertise in photolithography and image processing. His work significantly contributes to the development of advanced technologies in integrated circuit design.

Collaborations

Zhijie has collaborated with notable colleagues, including James Patrick Shiely and Qiliang Yan, further enhancing the innovative environment at Synopsys, Inc.

Conclusion

Zhijie Deng's work exemplifies the intersection of innovation and technology in the field of integrated circuit design. His patents reflect a commitment to advancing photolithographic simulation and image processing techniques.