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For the Inventor, By the Inventor

Aloha, OR, United States of America

James Patrick Shiely

This inventor holds 18 USPTO granted patents and 1 EPO patent, primarily in EUV Lithography. Top assignee: Synopsys, Inc.. Active years: 2007-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: James Patrick Shiely. Retrieved from https://idiyas.com/inventor/james-patrick-shiely

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 18

% Patents Active = 94.4


Average Co-Inventor Count = 2.9

ph-index = 4

Forward Citations = 60(Granted Patents)


Location History:

  • Aloha, OR (US) (2007 - 2017)
  • Portland, OR (US) (2012 - 2021)

Company Filing History:

goldMedal18 out of 2,613 
 
Synopsys, Inc.
 patents

Years Active: 2007-2021

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Areas of Expertise:
EUV Lithography
3D Mask Modeling
Etch-Bias Correction
Double-Patterning
Lithography Verification
Short-Range Effects
Long-Range Effects
Thin-Film Stack
Optical Lithography
Self-Aligned Double Patterning
Process-Sensitivity Model
Gradient-Magnitude
18 patents (USPTO):Explore Patents
1. 11200362 - 3D resist profile aware resolution enhancement techniques (2021-12-14),
2. 9646127 - 3D resist profile aware etch-bias model (2017-05-09),
3. 9484186 - Modeling and correcting short-range and long-range effects in E-beam lithography (2016-11-01),
4. 8972229 - Fast 3D mask model based on implicit countors (2015-03-03),
5. 8826193 - Detection and removal of self-aligned double patterning artifacts (2014-09-02),
6. 8689149 - Multi-patterning for sharp corner printing (2014-04-01),
7. 8601404 - Modeling EUV lithography shadowing effect (2013-12-03),
8. 8443308 - EUV lithography flare calculation and compensation (2013-05-14),
9. 8423917 - Modeling thin-film stack topography effect on a photolithography process (2013-04-16),
10. 8291353 - Non-linear rasterized contour filters (2012-10-16),
11. 8132128 - Method and system for performing lithography verification for a double-patterning process (2012-03-06),
12. 7933471 - Method and system for correlating physical model representation to pattern layout (2011-04-26),
13. 7784018 - Method and apparatus for identifying a manufacturing problem area in a layout using a gradient-magnitude of a process-sensitivity model (2010-08-24),
14. 7494751 - Method and apparatus for improving depth of focus during optical lithography (2009-02-24),
15. 7320119 - Method and apparatus for identifying a problem edge in a mask layout using an edge-detecting process-sensitivity model (2008-01-15),

Title: Innovations of James Patrick Shiely

Introduction

James Patrick Shiely is a notable inventor based in Aloha, OR (US). He has made significant contributions to the field of technology, particularly in the area of lithography and etch correction. With a total of 18 patents to his name, Shiely continues to push the boundaries of innovation.

Latest Patents

One of his latest patents is focused on "3D resist profile aware resolution enhancement techniques." This patent describes systems and techniques that can be calibrated based on empirical data. The 3D resist profile aware resolution enhancement models can be utilized in various applications, including lithography verification, etch correction, optical proximity correction, and assist feature placement. Another significant patent is the "3D resist profile aware etch-bias model." This model also emphasizes calibration based on empirical data and can be applied in similar areas as the previous patent.

Career Highlights

James Patrick Shiely is currently employed at Synopsys, Inc., where he applies his expertise in developing advanced technologies. His work has been instrumental in enhancing the capabilities of lithography and etching processes, which are critical in semiconductor manufacturing.

Collaborations

Shiely has collaborated with notable colleagues, including Hua Song and Lawrence S Melvin, III. These collaborations have contributed to the advancement of technologies in their respective fields.

Conclusion

James Patrick Shiely is a distinguished inventor whose work in 3D resist profile aware technologies has made a significant impact in the industry. His innovative patents and collaborations continue to shape the future of lithography and etch correction.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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