logo

For the Inventor, By the Inventor

Aloha, OR, United States of America

James Patrick Shiely

USPTO Granted Patents = 18


Average Co-Inventor Count = 2.9

ph-index = 4

Forward Citations = 57(Granted Patents)


Location History:

  • Aloha, OR (US) (2007 - 2017)
  • Portland, OR (US) (2012 - 2021)

Company Filing History:

goldMedal18 out of 2,487 
 
Synopsys, Inc.
 patents

Years Active: 2007-2021

Loading Chart...
Loading Chart...
18 patents (USPTO):Explore Patents
1. 11200362 - 3D resist profile aware resolution enhancement techniques (2021-12-14),
2. 9646127 - 3D resist profile aware etch-bias model (2017-05-09),
3. 9484186 - Modeling and correcting short-range and long-range effects in E-beam lithography (2016-11-01),
4. 8972229 - Fast 3D mask model based on implicit countors (2015-03-03),
5. 8826193 - Detection and removal of self-aligned double patterning artifacts (2014-09-02),
6. 8689149 - Multi-patterning for sharp corner printing (2014-04-01),
7. 8601404 - Modeling EUV lithography shadowing effect (2013-12-03),
8. 8443308 - EUV lithography flare calculation and compensation (2013-05-14),
9. 8423917 - Modeling thin-film stack topography effect on a photolithography process (2013-04-16),
10. 8291353 - Non-linear rasterized contour filters (2012-10-16),
11. 8132128 - Method and system for performing lithography verification for a double-patterning process (2012-03-06),
12. 7933471 - Method and system for correlating physical model representation to pattern layout (2011-04-26),
13. 7784018 - Method and apparatus for identifying a manufacturing problem area in a layout using a gradient-magnitude of a process-sensitivity model (2010-08-24),
14. 7494751 - Method and apparatus for improving depth of focus during optical lithography (2009-02-24),
15. 7320119 - Method and apparatus for identifying a problem edge in a mask layout using an edge-detecting process-sensitivity model (2008-01-15),

Title: Innovations of James Patrick Shiely

Introduction

James Patrick Shiely is a notable inventor based in Aloha, OR (US). He has made significant contributions to the field of technology, particularly in the area of lithography and etch correction. With a total of 18 patents to his name, Shiely continues to push the boundaries of innovation.

Latest Patents

One of his latest patents is focused on "3D resist profile aware resolution enhancement techniques." This patent describes systems and techniques that can be calibrated based on empirical data. The 3D resist profile aware resolution enhancement models can be utilized in various applications, including lithography verification, etch correction, optical proximity correction, and assist feature placement. Another significant patent is the "3D resist profile aware etch-bias model." This model also emphasizes calibration based on empirical data and can be applied in similar areas as the previous patent.

Career Highlights

James Patrick Shiely is currently employed at Synopsys, Inc., where he applies his expertise in developing advanced technologies. His work has been instrumental in enhancing the capabilities of lithography and etching processes, which are critical in semiconductor manufacturing.

Collaborations

Shiely has collaborated with notable colleagues, including Hua Song and Lawrence S Melvin, III. These collaborations have contributed to the advancement of technologies in their respective fields.

Conclusion

James Patrick Shiely is a distinguished inventor whose work in 3D resist profile aware technologies has made a significant impact in the industry. His innovative patents and collaborations continue to shape the future of lithography and etch correction.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…