The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2013
Filed:
May. 02, 2011
James Shiely, Aloha, OR (US);
Hua Song, San Jose, CA (US);
James Shiely, Aloha, OR (US);
Hua Song, San Jose, CA (US);
Synopsys Inc., Mountain View, CA (US);
Abstract
Extreme ultraviolet (EUV) lithography flare calculation and compensation is disclosed herein. A method of calculating flare for a mask for use in EUV lithography includes decomposing the flare power spectrum density (PSD) into a low frequency component and a high frequency component. Further, the method includes receiving a plurality of layouts in a flare map generator. Each of the plurality of layouts corresponds to a chip pattern location on the mask. Moreover, the method includes generating, using the flare map generator, a low frequency flare map for the mask from the low frequency component by using fast Fourier transform (FFT).