Company Filing History:
Years Active: 2009-2023
Title: **Hua Song: Innovator in Lithography and Etching Technologies**
Introduction
Hua Song, an accomplished inventor based in San Jose, California, holds an impressive portfolio of 16 patents. His innovative work primarily focuses on advancements in lithography and etching processes, which are essential for semiconductor manufacturing and other related fields.
Latest Patents
Among his notable contributions, two of Hua's latest patents stand out. The first, titled "Inverse etch model for mask synthesis," introduces a method to obtain critical dimension (CD) measurements of resist patterns and water patterns created during lithography and etching processes. This dual measurement approach allows for the calibration of both forward and inverse etch models, effectively reducing prediction errors and improving manufacturing precision.
The second patent, "3D resist profile aware resolution enhancement techniques," describes systems and techniques for enhancing the resolution of three-dimensional resist profiles. This patent emphasizes the calibration of 3D models based on empirical data, allowing these models to be utilized in various applications, including lithography verification, etch correction, optical proximity correction, and feature placement assistance.
Career Highlights
Hua Song has worked with leading technological companies, including Synopsys, Inc. and Apple Inc., where he has made significant contributions to the field of semiconductor technology. His extensive experience in these industry giants has allowed him to refine his innovative approaches and stay at the forefront of technological advancements.
Collaborations
Throughout his career, Hua has collaborated with esteemed colleagues, such as James Patrick Shiely and Qiaolin Zhang. These collaborations have fostered an environment of creativity and innovation, enabling the development of groundbreaking technologies and techniques that advance the industry.
Conclusion
Hua Song's contributions to the fields of lithography and etching have established him as a prominent inventor. With his array of patents and impactful collaborations, he continues to drive innovation and shape the future of semiconductor manufacturing. His work stands as a testament to the importance of innovative thinking in technology development.