The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 14, 2021
Filed:
Apr. 14, 2017
Applicant:
Synopsys, Inc., Mountain View, CA (US);
Inventors:
Assignee:
Synopsys, Inc., Mountain View, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/39 (2020.01); G06F 30/392 (2020.01); G03F 1/36 (2012.01); G03F 1/80 (2012.01); G03F 7/20 (2006.01); G06F 119/18 (2020.01);
U.S. Cl.
CPC ...
G06F 30/392 (2020.01); G03F 1/36 (2013.01); G03F 1/80 (2013.01); G03F 7/705 (2013.01); G03F 7/70441 (2013.01); G06F 30/39 (2020.01); G06F 2119/18 (2020.01);
Abstract
Systems and techniques for three-dimension (3D) resist profile aware resolution enhancement techniques are described. 3D resist profile aware resolution enhancement models can be calibrated based on empirical data. Next, the 3D resist profile aware resolution enhancement models can be used in one or more applications, including, but not limited to, lithography verification, etch correction, optical proximity correction, and assist feature placement.