Hsinchu, Taiwan

Cheng En Wu

USPTO Granted Patents = 3 

Average Co-Inventor Count = 3.3

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2017-2021

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3 patents (USPTO):Explore Patents

Title: The Innovative Mind of Cheng En Wu: Pioneering Advances in Lithography and Integrated Circuits

Introduction: Cheng En Wu, a talented inventor based in Hsinchu, Taiwan, has made significant contributions to the field of integrated circuits and lithography through his innovative patents. With three patents to his name, he is known for developing advanced techniques that enhance the performance and efficiency of semiconductor manufacturing.

Latest Patents: Cheng's latest contributions include groundbreaking patents such as "3D Resist Profile Aware Resolution Enhancement Techniques." This patent describes systems and techniques that utilize 3D resist profile aware resolution enhancement models, which can be calibrated based on empirical data. These models are instrumental in various applications, including lithography verification, etch correction, optical proximity correction, and assist feature placement. Another notable patent is the "Method for Modeling a Photoresist Profile," which outlines a computer-implemented method to model a photoresist profile according to the gradient of an inhibitor concentration in the photoresist. This innovative approach aims to reduce distortion in printed photoresist patterns during the integrated circuit formation process.

Career Highlights: Cheng En Wu is currently employed at Synopsys, Inc., a leading company in electronic design automation. His work at Synopsys focuses on enhancing the capabilities of semiconductor manufacturing and addressing the complexities involved in the lithography process. Through his innovative mindset and technical expertise, Cheng has established himself as a key player in the field.

Collaborations: Cheng has collaborated with notable coworkers, including Hua Song and James Patrick Shiely. Their combined expertise and dedication to innovation have helped advance the development of pioneering technologies in the semiconductor industry.

Conclusion: Cheng En Wu's contributions to the field of integrated circuits and lithography underscore the importance of innovation in semiconductor manufacturing. His latest patents reflect his commitment to improving technology and enhancing performance, demonstrating that his work will continue to influence the industry for years to come.

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