The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2013
Filed:
Jan. 31, 2012
Applicants:
Hua Song, San Jose, CA (US);
James P. Shiely, Aloha, OR (US);
Lena Zavyalova, Austin, TX (US);
Inventors:
Assignee:
Synopsys, Inc., Mountain View, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract
Systems and techniques for modeling the EUV lithography shadowing effect are described. Some embodiments described herein provide a process model that includes an EUV lithography shadowing effect component. Polygon edges in a layout can be dissected into a set of segments. Next, the EUV lithography shadowing effect component can be used to bias each segment. The modified layout having the biased segments can then be used as input for other components in the process model.