This inventor holds 1 USPTO granted patent. Top assignee: Synopsys, Inc.. Active years: 2013.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2013
Title: Innovations of Lena Zavyalova
Introduction
Lena Zavyalova is an accomplished inventor based in Austin, TX (US). She has made significant contributions to the field of lithography, particularly in modeling the EUV lithography shadowing effect. Her work is essential for advancing technologies in semiconductor manufacturing.
Latest Patents
Lena holds 1 patent for her innovative work titled "Modeling EUV lithography shadowing effect." This patent describes systems and techniques for modeling the EUV lithography shadowing effect. The process model includes an EUV lithography shadowing effect component, which allows for the dissection of polygon edges in a layout into a set of segments. The EUV lithography shadowing effect component is then utilized to bias each segment, resulting in a modified layout that can be used as input for other components in the process model.
Career Highlights
Lena Zavyalova is currently employed at Synopsys, Inc., where she continues to push the boundaries of innovation in her field. Her expertise in lithography has positioned her as a key player in the development of advanced semiconductor technologies.
Collaborations
Lena has collaborated with notable colleagues, including Hua Song and James Patrick Shiely. These partnerships have further enhanced her research and development efforts in the industry.
Conclusion
Lena Zavyalova's contributions to the field of EUV lithography are noteworthy and demonstrate her commitment to innovation. Her patent and work at Synopsys, Inc. highlight her role as a leading inventor in the technology sector.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile