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For the Inventor, By the Inventor

Marlborough, MA, United States of America

Owendi Ongayi

This inventor holds 22 USPTO granted patents and 2 published patent applications and 4 EPO patents. Top assignees: Rohm & Haas Electronic Materials LLC, Dow Global Technolgoies LLC, Other. Active years: 2013-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Owendi Ongayi. Retrieved from https://idiyas.com/inventor/owendi-ongayi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 22 

% Patents Active = 63.6

 

Average Co-Inventor Count = 4.1

ph-index = 4

Forward Citations = 60(Granted Patents)


Location History:

  • Tarragona, ES (2016 - 2018)
  • Marlborough, MA (US) (2013 - 2020)

Company Filing History:

goldMedal20 out of 696 
 
Rohm & Haas Electronic Materials LLC
 patents
silverMedal3 out of 4,804 
 
Dow Global Technolgoies LLC
 patents
bronzeMedal1 out of 834,453 
Other
 patents
where one patent can have more than one assignee

Years Active: 2013-2020

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22 patents (USPTO):Explore Patents
1. 10754249 - Coating compositions for photolithography (2020-08-25),
2. 10481494 - Coating compositions for use with an overcoated photoresist (2019-11-19),
3. 10365562 - Coating compositions for use with an overcoated photoresist (2019-07-30),
4. 10114288 - Silicon-containing underlayers (2018-10-30),
5. 10031420 - Wet-strippable silicon-containing antireflectant (2018-07-24),
6. 10007184 - Silicon-containing underlayers (2018-06-26),
7. 9690199 - Coating compositions for photolithography (2017-06-27),
8. 9581901 - Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device (2017-02-28),
9. 9459533 - Polymer composition, photoresist comprising the polymer composition, and coated article comprising the photoresist (2016-10-04),
10. 9442377 - Wet-strippable silicon-containing antireflectant (2016-09-13),
11. 9323154 - Coating compositions for photolithography (2016-04-26),
12. 9244352 - Coating compositions for use with an overcoated photoresist (2016-01-26),
13. 9229319 - Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device (2016-01-05),
14. 9206276 - Photosensitive copolymer, photoresist comprising the copolymer, and method of forming an electronic device (2015-12-08),
15. 9182669 - Copolymer with acid-labile group, photoresist composition, coated substrate, and method of forming an electronic device (2015-11-10),

Title: The Innovative Mind of Owendi Ongayi

Introduction: Owendi Ongayi, a talented inventor based in Marlborough, MA, is known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Owendi Ongayi holds several patents in the areas of artificial intelligence, renewable energy, and sustainable technologies, showcasing his diverse range of expertise and forward-thinking approach.

Career Highlights: With a career spanning over two decades, Owendi Ongayi has worked with leading tech companies, research institutions, and universities to develop cutting-edge solutions that have revolutionized various industries.

Collaborations: Throughout his career, Owendi Ongayi has collaborated with top engineers, scientists, and researchers from around the world, fostering a culture of innovation and excellence in all his projects.

Conclusion: Owendi Ongayi's passion for innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors and entrepreneurs. His impact on the world of technology is truly remarkable.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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